Published in
Institute of Electrical and Electronics Engineers, IEEE Electron Device Letters, 9(28), p. 781-783, 2007
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Impact of $\hbox{CF}_{4}$ Plasma Treatment on GaN
Journal article published in 2007 by
Rongming Chu 
,
Chang Soo Suh,
Man Hoi Wong,
N. Fichtenbaum,
D. Brown,
L. McCarthy,
S. Keller,
Feng Wu,
J. S. Speck,
U. K. Mishra
,
Chang Soo Suh,
Man Hoi Wong,
N. Fichtenbaum,
D. Brown,
L. McCarthy,
S. Keller,
Feng Wu,
J. S. Speck,
U. K. Mishra
This paper was not found in any repository, but could be made available legally by the author.
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