Published in
Institute of Electrical and Electronics Engineers, IEEE Electron Device Letters, 7(28), p. 606-608, 2007
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Effect of $\hbox{SiN}_{x}$ Gate Dielectric Deposition Power and Temperature on a-Si:H TFT Stability
Journal article published in 2007 by
Alex Z. Kattamis,
Kunigunde H. Cherenack,
Bahman Hekmatshoar,
I.-Chun Cheng 
,
Helena Gleskova,
James C. Sturm,
Sigurd Wagner
,
Helena Gleskova,
James C. Sturm,
Sigurd Wagner
This paper was not found in any repository, but could be made available legally by the author.
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