Published in
Elsevier, Journal of Non-Crystalline Solids, 1-3(322), p. 225-232
DOI: 10.1016/s0022-3093(03)00206-0
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The effects of silicon nitride and silicon oxynitride intermediate layers on the properties of tantalum pentoxide films on silicon: X-ray photoelectron spectroscopy, X-ray reflectivity and capacitance–voltage studies
Journal article published in 2003 by
M. Passacantando 
,
F. Jolly,
L. Lozzi ,
V. Salerni,
P. Picozzi,
S. Santucci,
C. Corsi,
D. Zintu
,
F. Jolly,
L. Lozzi ,
V. Salerni,
P. Picozzi,
S. Santucci,
C. Corsi,
D. Zintu
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