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Elsevier, Journal of Materials Processing Technology, 1-3(206), p. 462-466

DOI: 10.1016/j.jmatprotec.2007.12.040

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Plasma treatment effects on Si and Si/dielectric film heterostructures

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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