Published in
Elsevier, Applied Surface Science, 23(253), p. 9228-9233
DOI: 10.1016/j.apsusc.2007.05.061
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Comparison of plasma chemistries for the dry etching of bulk single-crystal zinc-oxide and rf-sputtered indium–zinc-oxide films
Journal article published in 2007 by
W. T. Lim,
L. Stafford 
,
J. S. Wright,
L. F. Vossa,
R. Khanna,
Ju-Il Song,
Jae-Soung Park,
Young Woo Heo,
Joon-Hyung Lee,
Jeong-Joo Kim,
D. P. Norton,
S. J. Pearton
,
J. S. Wright,
L. F. Vossa,
R. Khanna,
Ju-Il Song,
Jae-Soung Park,
Young Woo Heo,
Joon-Hyung Lee,
Jeong-Joo Kim,
D. P. Norton,
S. J. Pearton
This paper was not found in any repository, but could be made available legally by the author.
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