Process Optimization of GaN Nanorods Fabricated Using CH4/H2/SF6 Inductively Coupled Plasma Etch Technology

American Scientific Publishers, Science of Advanced Materials, 12(7), p. 2523-2527

Journal article published in 2015 by M. A. M. Al-Suleiman, Y. Al-Hadeethi, A. Waag

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Process Optimization of GaN Nanorods Fabricated Using CH<sub>4</sub>/H<sub>2</sub>/SF<sub>6</sub> Inductively Coupled Plasma Etch Technology