Published in
American Institute of Physics, Journal of Vacuum Science and Technology A, 3(32), p. 031506
DOI: 10.1116/1.4868215
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Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
Journal article published in 2014 by
Micheal Burke,
Alan Blake,
Ian M. Povey,
Michael Schmidt,
Nikolay Petkov,
Patrick Carolan,
Aidan J. Quinn
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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