Published in
American Institute of Physics, Journal of Vacuum Science and Technology A, 2(29), p. 021016
DOI: 10.1116/1.3554691
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Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
Journal article published in 2011 by
N. Leick 
,
R. O. F. Verkuijlen,
L. Lamagna,
E. Langereis,
S. Rushworth,
F. Roozeboom,
M. C. M. van de Sanden,
W. M. M. Kessels
,
R. O. F. Verkuijlen,
L. Lamagna,
E. Langereis,
S. Rushworth,
F. Roozeboom,
M. C. M. van de Sanden,
W. M. M. Kessels
This paper is available in a repository.
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