Published in
American Institute of Physics, Journal of Vacuum Science and Technology B, 1(26), p. 286
DOI: 10.1116/1.2834555
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Realization of ultrashallow junctions by plasma immersion ion implantation and laser annealing
Journal article published in 2008 by
V. Vervisch,
H. Etienne,
F. Torregrosa,
L. Roux,
L. Ottaviani,
M. Pasquinelli 
,
T. Sarnet,
P. Delaporte
,
T. Sarnet,
P. Delaporte
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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