Published in
American Institute of Physics, Journal of Vacuum Science and Technology A, 4(23), p. 720
DOI: 10.1116/1.1938980
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Comment on “Plasma etching of high dielectric constant materials on silicon in halogen plasma chemistries” by L. Sha and J. P. Chang [J. Vac. Sci. Technol. A 22, 88 (2004)]
Journal article published in 2005 by
Luc Stafford 
,
Joëlle Margot
,
Joëlle Margot
This paper was not found in any repository, but could be made available legally by the author.
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