Published in

IOP Publishing, Journal of Micromechanics and Microengineering, 9(24), p. 095010

DOI: 10.1088/0960-1317/24/9/095010

Links

Tools

Export citation

Search in Google Scholar

Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating

Journal article published in 2014 by Johannes Kofler, Kerstin Schmoltner, Andreas Klug, Emil J. W. List-Kratochvil ORCID
Distributing this paper is prohibited by the publisher
Distributing this paper is prohibited by the publisher

Full text: Unavailable

Red circle
Preprint: archiving forbidden
Red circle
Postprint: archiving forbidden
Red circle
Published version: archiving forbidden
Policy details
Data provided by SHERPA/RoMEO