Published in

IOP Publishing, Journal of Physics D: Applied Physics, 39(47), p. 394014, 2014

DOI: 10.1088/0022-3727/47/39/394014

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Gate modulation of below-band-gap photoconductivity in ZnO nanowire field-effect-transistors

Journal article published in 2014 by Davide Cammi ORCID, Robert Röder, Carsten Ronning ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

Abstract We investigated the modulation of the photoconductivity under below-band gap excitation in single ZnO nanowire field effect transistors. Light excitation at 550 nm does not induce any change in the drain–source current when the gate voltage is kept at V gs = 0 V, but results in a current increase when it is set to V gs = −50 V. At this negative value of the gate voltage we further investigated the photo-reaction in the below-band-gap range 400–800 nm, observing a qualitative similar profile for all the photo-current curves. These results were attributed to a local effect, suggesting that the change in conductivity is due to the release of electrons from interface states located between the ZnO nanowire active channel and the gate dielectric SiO2.