Published in
Elsevier, Microelectronic Engineering, 7(88), p. 1517-1520
DOI: 10.1016/j.mee.2011.03.063
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Improved EOT and leakage current for metal–insulator–metal capacitor stacks with rutile TiO2
Journal article published in 2011 by
Mihaela Popovici,
Min-Soo Kim,
Kazuyuki Tomida,
Johan Swerts,
Hilde Tielens,
Alain Moussa,
Olivier Richard,
Hugo Bender,
Alexis Franquet,
Thierry Conard,
Laith Altimime,
Sven Van Elshocht,
Jorge A. Kittl 
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