Published in
American Institute of Physics, Review of Scientific Instruments, 6(85), p. 063506
DOI: 10.1063/1.4875982
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Improved ion implant fluence uniformity in hydrogen enhanced glow discharge plasma immersion ion implantation into silicon
Journal article published in 2014 by
J. Luo,
L. H. Li,
H. T. Liu,
K. M. Yu 
,
Y. Xu,
X. J. Zuo,
P. Z. Zhu,
Y. F. Ma,
Ricky K. Y. Fu,
Paul K. Chu
,
Y. Xu,
X. J. Zuo,
P. Z. Zhu,
Y. F. Ma,
Ricky K. Y. Fu,
Paul K. Chu
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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