Published in
American Institute of Physics, Applied Physics Letters, 21(103), p. 211103, 2013
DOI: 10.1063/1.4829477
Links
Tools
Sub-250 nm low-threshold deep-ultraviolet AlGaN-based heterostructure laser employing HfO2/SiO2 dielectric mirrors
Journal article published in 2013 by
Tsung-Ting Kao,
Yuh-Shiuan Liu,
M.-D. Mahbub Satter,
Xiao-Hang Li,
Zachary Lochner,
P. Douglas Yoder,
Theeradetch Detchprohm 
,
Russell D. Dupuis,
Shyh-Chiang Shen,
Jae-Hyun Ryou,
Alec M. Fischer,
Yong Wei,
Hongen Xie,
Fernando A. Ponce
,
Russell D. Dupuis,
Shyh-Chiang Shen,
Jae-Hyun Ryou,
Alec M. Fischer,
Yong Wei,
Hongen Xie,
Fernando A. Ponce
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
Data provided by 