Published in
American Institute of Physics, Applied Physics Letters, 5(102), p. 051916
DOI: 10.1063/1.4789983
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Reduced threading dislocation densities in high-T/N-rich grown InN films by plasma-assisted molecular beam epitaxy
Journal article published in 2013 by
Bernhard Loitsch,
Fabian Schuster,
Martin Stutzmann 
,
Gregor Koblmüller
,
Gregor Koblmüller
This paper was not found in any repository, but could be made available legally by the author.
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