Published in
American Institute of Physics, Journal of Applied Physics, 3(81), p. 1143-1149, 1997
DOI: 10.1063/1.363904
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Amorphization and crystallization in high-dose Zn+-implanted silicon
Journal article published in 1997 by
M. Kalitzova,
S. Simov,
R. A. Yankov,
C.-H. Angelov,
G. Vitali,
M. Rossi,
C. Pizzuto,
G. Zollo 
,
J. Fauré,
L. Killian,
P. Bonhomme,
M. Voelskow
,
J. Fauré,
L. Killian,
P. Bonhomme,
M. Voelskow
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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