Published in
American Institute of Physics, Journal of Applied Physics, 6(106), p. 063302
DOI: 10.1063/1.3223350
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Correlation between surface chemistry and ion energy dependence of the etch yield in multicomponent oxides etching
Journal article published in 2009 by
P.-M. Bérubé,
J.-S. Poirier,
J. Margot,
L. Stafford 
,
P. F. Ndione,
M. Chaker,
R. Morandotti
,
P. F. Ndione,
M. Chaker,
R. Morandotti
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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