Published in
American Institute of Physics, Journal of Applied Physics, 11(100), p. 113705
DOI: 10.1063/1.2396796
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Fabrication of Cu/Co bilayer gate electrodes using selective chemical vapor deposition and soft lithographic patterning
Journal article published in 2006 by
H. J. Yang,
J. Lee 
,
S. Kim,
Y. K. Ko,
H. J. Shin,
J. G. Lee,
C. Kim,
M. M. Sung,
H. J. Bang,
B. S. Cho,
Y. H. Bae,
J. H. Lee,
D. H. Kim,
C. O. Jeong,
S. Y. Kim
and other authors.
,
S. Kim,
Y. K. Ko,
H. J. Shin,
J. G. Lee,
C. Kim,
M. M. Sung,
H. J. Bang,
B. S. Cho,
Y. H. Bae,
J. H. Lee,
D. H. Kim,
C. O. Jeong,
S. Y. Kim
and other authors.
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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