Published in
American Institute of Physics, Journal of Applied Physics, 9(95), p. 4806-4814, 2004
DOI: 10.1063/1.1690861
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A phase-field approach to the simulation of the excimer laser annealing process in Si
Journal article published in 2004 by
Vittorio Privitera,
Paola Alippi 
,
Bengt Svensson,
Antonino La Magna,
Guglielmo Fortunato,
Marco Camalleri
,
Bengt Svensson,
Antonino La Magna,
Guglielmo Fortunato,
Marco Camalleri
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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