Published in
American Institute of Physics, Applied Physics Letters, 26(83), p. 5407
DOI: 10.1063/1.1637440
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Clusters formation in ultralow-energy high-dose boron-implanted silicon
Journal article published in 2003 by
F. Cristiano,
X. Hebras,
N. Cherkashin 
,
A. Claverie,
W. Lerch,
S. Paul
,
A. Claverie,
W. Lerch,
S. Paul
This paper is available in a repository.
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