Nitrogen self-diffusion studies in amorphous precursor-derived Si3BC4.3N2 ceramics were carried out, using ion implanted stable N15 isotopes as tracers and secondary ion mass spectrometry for depth profiling. The analysis of the diffusion profiles in the range of 1500–1700 °C did not show the typical Gaussian broadening of the implantation profiles. Instead, we observed the occurrence of a high concentration region where the width of the implantation profile is nearly unchanged due to implantation damage, and a low concentration region where diffusion occurs. The experimentally determined diffusivities obey an Arrhenius behavior with an activation enthalpy of about H=7 eV and a pre-exponential factor D0 in the order of 5 m2/s which indicates a diffusion mechanism via vacancy-like defects.