Published in
American Institute of Physics, Applied Physics Letters, 15(69), p. 2163
DOI: 10.1063/1.117152
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Movable-mask reactive ion etch process for thickness control in devices
Journal article published in 1996 by
R. L. Sandstrom,
B. Pezeshki,
F. Agahi,
R. Martel 
,
J. G. Crockett
,
J. G. Crockett
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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