Published in
American Institute of Physics, Applied Physics Letters, 12(67), p. 1727
DOI: 10.1063/1.115030
Links
Tools
Kinetic modeling of the atomic layer epitaxy processing window in group IV semiconductor growth
Journal article published in 1995 by
Gyula Eres 
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
Data provided by 