Published in

Royal Society of Chemistry, RSC Advances, 48(3), p. 25902, 2013

DOI: 10.1039/c3ra45966g

Links

Tools

Export citation

Search in Google Scholar

Silicon protected with atomic layer deposited TiO2: durability studies of photocathodic H2 evolution

This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

Full text: Download

Red circle
Preprint: archiving forbidden
Green circle
Postprint: archiving allowed
Green circle
Published version: archiving allowed
Data provided by SHERPA/RoMEO