Published in
Springer Verlag, Microsystem Technologies, 10-11(20), p. 2023-2029
DOI: 10.1007/s00542-013-2055-x
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Characterization method for new resist formulations for HAR patterns made by X-ray lithography
Journal article published in 2013 by
Danays Kunka,
Jürgen Mohr,
Vladimir Nazmov,
Jan Meiser,
Pascal Meyer,
Maximilian Amberger,
Frieder Koch 
,
Joachim Schulz,
Marco Walter,
Thomas Duttenhofer,
Anja Voigt,
Gisela Ahrens,
Gabi Grützner
,
Joachim Schulz,
Marco Walter,
Thomas Duttenhofer,
Anja Voigt,
Gisela Ahrens,
Gabi Grützner
This paper was not found in any repository, but could be made available legally by the author.
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