Parallel arrays of either Au or Pd nanowires were fabricated on glass substrates via the electrochemical process of lithographically patterned nanowire electrodeposition (LPNE) and then characterized with scanning electron microscopy (SEM) and a series of optical diffraction measurements at 633 nm. Nanowires with widths varying from 25 to 150 nm were electrodeposited onto nanoscale Ni surfaces created by the undercut etching of a photoresist pattern on a planar substrate. With the use of a simple transmission grating geometry, up to 60 diffraction orders were observed from the nanowire gratings, with separate oscillatory intensity patterns appearing in the even and odd diffraction orders. The presence of these intensity oscillations is attributed to the LPNE array fabrication process, which creates arrays with alternating interwire spacings of distances d +Delta and d -Delta, where d = 25 microm and the asymmetry Delta varied from 0 to 3.5 microm. The amount of asymmetry could be controlled by varying the LPNE undercut etching time during the creation of the nanoscale Ni surfaces. The Fourier transform of a mathematical model of the nanowire array was used to predict the diffraction intensity patterns and quantitatively determine Delta for any grating. Additional sensitivity and an expanded diffraction order range were obtained through the use of external reflection (ER) and total internal reflection (TIR) diffraction geometries.