The deposition of nickel/amorphous carbon (Ni/a-C) films by a hybrid plasma process combining magnetron sputtering of a Ni target and plasma enhanced chemical vapor deposition using methane gas has been investigated. The formation of nickel nanowires encapsulated by a-C matrix has been demonstrated by transmission electron microscopy (TEM). The obtained nanowires array can be easily dispersed or can be simply converted to a Ni-filled CNT array by annealing at 350 °C as confirmed by TEM analysis. The developed fabrication method of Ni-filled CNT array is a low temperature technique compatible with substrates of low melting point.