Published in
Springer Verlag, Plasma Chemistry and Plasma Processing
DOI: 10.1007/s11090-016-9703-8
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Preparation of Silicon Thin Films of Different Phase Composition from Monochlorosilane as a Precursor by RF Capacitive Plasma Discharge
Journal article published in 2016 by
L. A. Mochalov 
,
R. A. Kornev,
A. V. Nezhdanov,
A. I. Mashin,
A. S. Lobanov,
A. V. Kostrov,
V. M. Vorotyntsev,
A. V. Vorotyntsev
,
R. A. Kornev,
A. V. Nezhdanov,
A. I. Mashin,
A. S. Lobanov,
A. V. Kostrov,
V. M. Vorotyntsev,
A. V. Vorotyntsev
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