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Trans Tech Publications, Solid State Phenomena, (170), p. 78-82, 2011

DOI: 10.4028/www.scientific.net/ssp.170.78

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Growth and Characterization of Well-Aligned RuO<sub>2</sub>/R-TiO<sub>2</sub> Heteronanostructures on Sapphire (100) Substrates by Reactive Magnetron Sputtering

Journal article published in 2011 by Hung Pin Hsu ORCID, Ying Sheng Huang, Chien Nan Yeh, Yi Min Chen, Dah Shyang Tsai, Kwong Kau Tiong
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

We report the growth of well-aligned RuO2/R-TiO2 heteronanostructures on sapphire (100) substrates by reactive magnetron sputtering using Ti and Ru metal targets under different conditions. The surface morphology and structural properties of the as-deposited heteronanostructures were characterized using field-emission scanning electron microscopy (FESEM), X-ray diffraction (XRD), transmission electron microscopy (TEM) and selected-area electron diffractometry (SAED). The FESEM micrographs and XRD patterns indicated the growth of vertically aligned RuO2(001) nanotubes and twinned V-shaped RuO2(101) nanowedges (NWs) on top of R-TiO2 nanorods under different sputtering pressures. TEM and SAED characterizations of the V-shaped RuO2 NWs showed that the NWs are crystalline RuO2 with twin planes of (101) and twin direction of [ 01] at the V-junction.