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Trans Tech Publications, Solid State Phenomena, (108-109), p. 235-240, 2005

DOI: 10.4028/www.scientific.net/ssp.108-109.235

Trans Tech Publications, Solid State Phenomena, p. 235-240

DOI: 10.4028/3-908451-13-2.235

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Quantum-Chemical Simulation of Silicon Grain Boundaries Contaminated by Oxygen and Carbon

Journal article published in 2005 by Anis M. Saad, Alex L. Pushkarchuk, A. V. Mazanik ORCID, A. K. Fedotov, S. A. Kuten
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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Abstract

Transformation of the “core” atomic structure and electronic states of the tilt Σ5 θ = 37° [001]/(130) grain boundary in poly-Si due to incorporation of carbon atoms into the oxygencontaining complexes is studied using MM and MO LCAO methods. Different numbers n = 1 ÷ 4 of C-atoms were introduced into the 5-fold interstitial positions in the initial O-containing complexes built-up from SiO3 and SiO4 configurations at the GB “core”. Incorporation of C-atoms into SiO3 and SiO4 complexes leads to the formation of Si-O-C-Si chains and shifting of the donorlike levels generated by SiO3 and SiO4 configurations to the bottom of the conduction band with an increase in the number of the incorporated C-atoms.