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Trans Tech Publications, Materials Science Forum, (695), p. 541-544, 2011

DOI: 10.4028/www.scientific.net/msf.695.541

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TEM Analysis on Nanovoid Formation in Annealed Amorphous Oxides

Journal article published in 2011 by Ryusuke Nakamura, Takehiro Shudo, Akihiko Hirata ORCID, Manabu Ishimaru, Hideo Nakajima
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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Abstract

Formation behavior of nanovoids during the annealing of amorphous Al2O3 and WO3 was studied by transmission electron microscopy. The density and size of the voids in Al2O3 and WO3 increase with increasing annealing temperature from 973 to 1123 K and from 573 to 673 K, respectively. It is suggested that the formation of nanovoids during annealing is attributed to the large difference in density between as-deposited amorphous and crystalline oxides.