Published in
American Institute of Physics, Journal of Vacuum Science and Technology B, 1(29), p. 011018
DOI: 10.1116/1.3527073
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Residue growth on metallic hard mask after dielectric etching in fluorocarbon based plasmas. II. Solutions
Journal article published in 2011 by
N. Posseme,
R. Bouyssou,
T. Chevolleau,
T. David,
V. Arnal,
M. Darnon 
,
P.-H. Brun,
C. Verove,
O. Joubert
,
P.-H. Brun,
C. Verove,
O. Joubert
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
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