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Springer Verlag, Plasma Chemistry and Plasma Processing, 5(30), p. 641-661
DOI: 10.1007/s11090-010-9238-3
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An Analysis of Low Frequency Discharge in a CH3SiCl3-Ar-H2 Mixture by Optical Emission Spectroscopy and Actinometry
Journal article published in 2010 by
Barbara Kułakowska-Pawlak,
Piotr Jamróz 
This paper is available in a repository.
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