Published in

Trans Tech Publications, Journal of Nano Research, (11), p. 13-18, 2010

DOI: 10.4028/www.scientific.net/jnanor.11.13

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Self-Diffusion in Magnetron-Sputtered Nanocrystalline Fe Films

This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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Abstract

a scha@tu-clausthal.de Abstract. Self-diffusion in magnetron sputtered nanocrystalline Fe films was investigated by neutron reflectometry on [ nat Fe(10 nm)/ 57 Fe(5 nm)] 20 isotope multilayers between 310 and 510°C. The determined diffusivities corresponding to diffusion length between 0.8 – 2.1 nm are time dependent and decrease by more than two orders of magnitude during isothermal annealing. This behaviour can be attributed due to the annihilation of frozen-in point defects, formed during sputtering. For very long annealing times of more than 8 days the diffusivities above 400°C are in good accordance with the volume diffusivities on single crystals given in the literature. However, at temperatures below 400°C the diffusivities are higher than extrapolated literature data, indicating that defect annihilation is still an ongoing process. Furthermore, a comparison of diffusivities obtained for nanocrystalline Fe films prepared by magnetron sputtering and ion beam sputtering, respectively, is presented and discussed.