Atmospheric pressure dielectric barrier discharge deposition of organosilicon thin films on aluminium foils was investigated for different electrical excitations. The plasma reactor was fed with nitrogen and hexamethyldisiloxane as film precursor. Scanning electron microscopy observations and secondary ion mass spectrometry associated with X-ray photoelectron spectroscopy showed how the modulation of the electrical excitation can affect the morphology and the chemistry of the coatings. The corrosion behaviour of the films obtained was characterized by means of electrochemical techniques. Relationships between the electrical excitation and the electrochemical properties of the films are reported and these results have been correlated with the morphology and chemistry modifications of the films.