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High Volume Industrial PECVD System for In-Line Deposition of SiN:H on Solar Wafers

This paper was not found in any repository; the policy of its publisher is unknown or unclear.
This paper was not found in any repository; the policy of its publisher is unknown or unclear.

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Abstract

SeriesInformation ; 24th European Photovoltaic Solar Energy Conference, 21-25 September 2009, Hamburg, Germany; 2190-2192 ; Abstract ; We present new industrial production tool for depositing anti-reflective layers on silicon solar cells. These films also provide excellent passivation of bulk defects in multicrystalline wafer material as well as surface passivation on monocrystalline silicon wafers. Based on well-proven centrotherm PECVD technology, we developed an in-line-system, which may be configured to meet the high throughput requirements of future production lines.