Self-assembly patterning using block copolymer for advanced CMOS technology: optimisation of plasma etching process

Advanced Etch Technology for Nanopatterning

Proceedings article published in 2012 by T. Chevolleau, G. Cunge, M. Delalande, X. Chevalier, R. Tiron, S. David, M. Darnon

, C. Navarro

This paper was not found in any repository, but could be made available legally by the author.

Full text: Unavailable

Preprint: archiving forbidden

Postprint: archiving allowed

Upload

Published version: archiving allowed

Upload

Policy details

Data provided by

International audience