Published in
Advanced Etch Technology for Nanopatterning
DOI: 10.1117/12.920312
Links
- ORCID
- Society of Photo-optical Instrumentation Engineers
- [hal.archives-ouvertes.fr]
- [hal.archives-ouvertes.fr]
- [hal.archives-ouvertes.fr]
Tools
Towards new plasma technologies for 22nm gate etch processes and beyond
Journal article published in 2012 by
O. Joubert,
M. Darnon 
,
G. Cunge,
E. Pargon,
T. David,
D. Thibault,
C. Petit-Etienne,
L. Vallier,
N. Posseme,
P. Bodart,
L. Azarnouche,
R. Blanc,
M. Haas,
M. Brihoum,
S. Banna
and other authors.
,
G. Cunge,
E. Pargon,
T. David,
D. Thibault,
C. Petit-Etienne,
L. Vallier,
N. Posseme,
P. Bodart,
L. Azarnouche,
R. Blanc,
M. Haas,
M. Brihoum,
S. Banna
and other authors.
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
Preprint: archiving forbidden
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Abstract
International audience