Organic static induction transistors, which have relatively short vertical channels, are attractive devices for their low operating voltage and high operating speed. However, a gate voltage larger than the Schottky barrier potential usually leads to a large gate leakage current and thus poor device performance. To limit the gate leakage current, we considered adding insulating layers around the gate electrode. The oxidization of aluminum during a physical vapor deposition process was used to form insulating layers around the gate electrode. The results demonstrate that by appending gate insulating layers, gate leakage currents can be effectively reduced and device characteristics, especially the on/off ratio, can be improved.