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American Physical Society, Physical review B, 10(75)

DOI: 10.1103/physrevb.75.104103

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Ferroelectric polarization-leakage current relation in high quality epitaxialPb(Zr,Ti)O3films

Journal article published in 2007 by L. Pintilie, I. Vrejoiu, D. Hesse, G. LeRhun, M. Alexe ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

Leakage current measurements were performed on epitaxial, single-crystal quality Pb(Zr,Ti)O3 films with thicknesses in the 50–300 nm range. It was found that the voltage behavior of the leakage current has a minor dependence on thickness, which rules out the space-charge limited currents as main leakage source. Temperature-dependent measurements were performed to obtain more information on the transport mechanism through the metal-ferroelectric-metal (MFM) structure. The results are analyzed in the frame of interface-controlled Schottky emission. A surprisingly low value of only 0.12–0.13 eV was obtained for the potential barrier, which is much smaller than the reported value of 0.87 eV [ I. Stolichnov et al. Appl. Phys. Lett. 75 1790 (1999)]. The result is explained by the effect of the ferroelectric polarization on the potential barrier height. The low value of the effective Richardson constant, of the order of 10−7–10−6 A∕cm2 K2, suggests that the pure thermionic emission is not the adequate conduction mechanism for epitaxial MFM structures. The true mechanism might be interface-controlled injection, followed by a low mobility drift through the film volume.