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Published in

American Institute of Physics, Journal of Applied Physics, 6(101), p. 066101

DOI: 10.1063/1.2711144

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Submicron patterning of a catalyst film by scanning probe nanolithography for a selective chemical vapor deposition of carbon nanotubes

This paper is available in a repository.
This paper is available in a repository.

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Abstract

Submicrometric catalyst patterns have been fabricated by atomic force nanolithography and the subsequent selective growth of carbon nanotubes has been successfully verified. Rectangular stripes ( ∼ 350 nm wide) were engraved onto a polymethylmethacrylate film, deposited onto SiO2/Si, by polymer removal with atomic force microscopy nanoindentation. Metallic catalyst patterns were subsequently obtained after 3 nm Ni deposition and lift-off of the residual polymer. Multiwalled carbon nanotubes were then grown by thermal chemical vapor deposition onto the Ni stripes. The various steps of nanopatterning and of carbon nanotubes growth are also studied by scanning electron microscopy and Raman measurements.