A novel low-cost nanoring array fabrication method that combines the process of lithographically patterned nanoscale electrodeposition (LPNE) with colloidal lithography is described. Nanoring array fabrication is accomplished in three steps: (i) a thin (70 nm) sacrificial nickel or silver film is first vapor-deposited onto a plasma-etched packed colloidal monolayer; (ii) the polymer colloids are removed from the surface, a thin film of positive photoresist is applied, and a backside exposure of the photoresist is used to create a nanohole electrode array; (iii) this array of nanoscale cylindrical electrodes is then used for the electrodeposition of a gold, silver or nickel nanorings. Removal of the photoresist and sacrificial metal film yielded a nanoring array in which all of the nanoring dimensions are set independently: the inter-ring spacing is fixed by the colloidal radius, the radius of the nanorings is controlled by the plasma etching process, and the width of the nanorings is controlled by the electrodeposition process. A combination of scanning electron microscopy (SEM) measurements and Fourier transform near infrared (FT-NIR) absorption spectroscopy were used to characterize the nanoring arrays. Nanoring arrays with radii from 200 to 400 nm exhibited a single strong NIR plasmonic resonance with an absorption maximum wavelength that varied linearly from 1.25 to 3.33 microns as predicted by a simple standing wave model linear antenna theory. This simple yet versatile nanoring array fabrication method was also used to electrodeposit concentric double gold nanoring arrays that exhibited multiple NIR plasmonic resonances.