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Elsevier, Vacuum, 3-4(66), p. 189-195

DOI: 10.1016/s0042-207x(02)00128-8

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Surface molecular dynamics of Si/SiO2 reactive ion etching

Journal article published in 2002 by S. Hamaguchi ORCID, H. Ohta
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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