The results of an experimental study of the He I 447.1 nm line and its forbidden component at high electron number density are presented and compared with profiles calculated using computer simulation method. Michelson interferometer at 632.8 nm was used to measure plasma electron number density in the range (1–7) × 1023 m− 3 while electron temperatures for the same experimental conditions in the range of 25 000 K to 35 000 K were determined using several spectroscopic techniques. The agreement of experimental overall line shape with computer simulation results is within 10% of what is well within theoretical and experimental uncertainty. This favorable comparison enabled the development of a simple approximate formula for the evaluation of electron number density from the measurement of wavelength separation between peaks of allowed and forbidden lines. This technique of plasma diagnostics is not sensitive to the presence of self-absorption of strong He I allowed line. The derivation of approximate formula with estimated accuracy of 15% was followed by detailed comparison with other experimental and theoretical data.