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Elsevier, Microelectronics Reliability, 9-10(52), p. 1909-1912

DOI: 10.1016/j.microrel.2012.06.012

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Analysis and modeling of the gate leakage current in advanced nMOSFET devices with severe gate-to-drain dielectric breakdown

Journal article published in 2012 by E. Miranda ORCID, T. Kawanago, K. Kakushima, J. Suñé, H. Iwai
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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