Published in
Elsevier, Microelectronic Engineering, (118), p. 47-53
DOI: 10.1016/j.mee.2013.12.031
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Fully CMOS-compatible top-down fabrication of sub-50nm silicon nanowire sensing devices
Journal article published in 2014 by
Yordan M. Georgiev,
Nikolay Petkov,
Brendan McCarthy 
,
Ran Yu,
Vladimir Djara,
Dan O’Connell,
Olan Lotty,
Adrian M. Nightingale,
Nuchutha Thamsumet,
John C. deMello,
Alan Blake ,
Samaresh Das,
Justin D. Holmes
,
Ran Yu,
Vladimir Djara,
Dan O’Connell,
Olan Lotty,
Adrian M. Nightingale,
Nuchutha Thamsumet,
John C. deMello,
Alan Blake ,
Samaresh Das,
Justin D. Holmes
This paper is available in a repository.
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