Hard magnetic thin films preparation is a key issue on the development of new micro-electro-mechanical systems. Vapour phase prep-aration techniques are desired because they are more easily incorporated into the typical microfabrication techniques. In this work we present the deposition of SmCo thin films by both magnetron sputtering (MS) and pulsed laser deposition (PLD). Thin films prepared by MS at temperatures below 400 °C are amorphous and present soft magnetic properties, whereas those deposited at 450 °C are nanocrys-talline and present hard magnetic properties with a well defined in plane easy axis. The PLD prepared samples are nanocrystalline, but present soft magnetic properties. In both cases, post deposition annealing treatments have been successfully carried out, giving rise to a maximum coercivity of 2.7 T.