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Elsevier, Thin Solid Films, (438-439), p. 326-329

DOI: 10.1016/s0040-6090(03)00739-9

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Fabrication and characterization of ultra-thin film transistor using TMPD-CnTCNQ LB films

Journal article published in 2003 by Hirotaka Sakuma, Masaaki Iizuka, Masakazu Nakamura ORCID, Kazuhiro Kudo
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

Charge–Transfer (CT) complexes are stabilized by partial transfer of electric charges from donor molecules to acceptor molecules. The conductivity of the film of CT-complexes can be controlled if the degree of charge transfer is varied by applying an external field, for example an electric field. In this study, we fabricated field-effect transistors (FETs) using CT complex Langmuir–Blodgett (LB) films (TMPD-CnTCNQ), and have attempted to control the conductivity of the CT-complex layers by gate voltages. The temperature dependence of conductivity shows that semiconducting and metallic parts coexist in parallel between the electrodes.