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Elsevier, Physica D: Nonlinear Phenomena, 1-4(96), p. 384-395

DOI: 10.1016/0167-2789(96)00036-x

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Instabilities in the growth of compact electrodeposits

Journal article published in 1996 by J. M. Pastor ORCID, M. A. Rubio
This paper is available in a repository.
This paper is available in a repository.

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Abstract

We have investigated the morphological instabilities in electrochemical compact growth. The experimental system consisted in 0.5 M aqueous solutions of CuSO4 in a quasi-2D strip geometry. The deposits were made at low constant current densities ranging between 20 and 100 mA cm−2. We monitored the morphology of the growing interface and the electrical parameters of the system. We find two different growth regimes: at short times the interfaces show roughness scaling with a roughness exponent, α = 0.78 ± 0.05; at longer times an instability develops which causes an increase in the growth speed and the external applied voltage. Some characteristic time and length scales of this latter instability compare well with theoretical results in directional solidification models.